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专利名称：Colloidal silica consisting of silica particles
fixing nitrogen contained alkaline compound
发明人：Yuko Ishiguri,Kunio Ohkubo,Yukiyo
Saito,Masahiro Izumi,Masaru Nakajo,KuniakiMaejima,Hiroaki Tanaka
申请号：US12322296申请日：20090130
公开号：US20090253813A1公开日：20091008
摘要：A colloidal silica comprising, silica particles inside of which or on the surface ofwhich a nitrogen containing alkaline compound is fixed, wherein said silica particles areprepared by forming and growing colloid particles using the nitrogen containing alkalinecompound. Said colloidal silica can be prepared by preparing active silicic acid aqueoussolution contacting silicate alkali aqueous solution with cation exchange resin, adding thenitrogen containing alkaline compound and heating, and then growing up particles bybuild-up method.
申请人：Yuko Ishiguri,Kunio Ohkubo,Yukiyo Saito,Masahiro Izumi,MasaruNakajo,Kuniaki Maejima,Hiroaki Tanaka
地址：Tokyo JP,Tokyo JP,Tokyo JP,Tokyo JP,Tokyo JP,Tokyo JP,Ayase-shi JP
国籍：JP,JP,JP,JP,JP,JP,JP
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