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专利名称：Guard ring structure and method for
forming the same
发明人：Chiyuan Lu,Chien-Chih Lin,Cheng-Chou
Hung,Yu-Hua Huang
申请号：US14020367申请日：20130906公开号：US09397032B2公开日：20160719
专利附图：
摘要：A guard ring structure is provided, including a semiconductor substrate with acircuit region encircled by a first ring and a second ring. In one embodiment, the
semiconductor substrate has a first dopant type, and the first and second ring
respectively includes a plurality of separated first doping regions formed in a top portionof the semiconductor substrate, having a second dopant type opposite to the firstconductivity type, and an interconnect element formed over the semiconductorsubstrate, covering the first doping regions.
申请人：MediaTek Singapore Pte. Ltd.
地址：Singapore SG
国籍：SG
代理机构：McClure, Qualey & Rodack, LLP
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