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专利名称：Dental implant system and method发明人：Akira Kitamura,Ryoji Kitamura申请号：US10956559申请日：20041001公开号：US07125253B2公开日：20061024
专利附图：
摘要：A dental implant system and method are provided. The dental implant methodmay include forming a hole in bone of an alveolar of a maxilla, adjacent a sinus cavity. Thehole is typically formed so as to leave a bridge portion separating the hole from abottom surface of a sinus cavity wall. The method may further include separating the
bridge portion from the sinus cavity wall, and lifting the bridge portion and the sinusmembrane together at least partially into the sinus cavity.
申请人：Akira Kitamura,Ryoji Kitamura
地址：36-26, Shiroyamadai 2-Chome Nagasaki-shi, Nagasaki 852-8027 JP,36-26,Shiroyamadai 2-Chome Nagasaki-shi, Nagasaki 852-8027 JP
国籍：JP,JP
代理机构：Alleman Hall McCoy Russell & Tuttle LLP
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