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PROCESS FOR DEPOSITING AN ELECTRICALLY CONDUCTIVE

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专利名称:PROCESS FOR DEPOSITING AN

ELECTRICALLY CONDUCTIVE LAYER ANDASSEMBLY OF THE LAYER ON A POROUSSUPPORT SUBSTRATE

发明人:Karl Kailer,Georg Kunschert,Stefan

Schlichtherle,Georg Strauss

申请号:US12349735申请日:20090107

公开号:US20100047565A1公开日:20100225

摘要:A process for depositing an electrically conductive, preferably perovskitic layeruses a pulsed sputtering process. The layer has a low diffusivity for the elements in theiron group and is especially suitable for use in solid oxide fuel cells (SOFC). An assemblyof the electrically conductive ceramic layer on a porous support substrate is alsoprovided.

申请人:Karl Kailer,Georg Kunschert,Stefan Schlichtherle,Georg Strauss

地址:Breitenwang AT,Pflach AT,Ehrwald AT,Munster AT

国籍:AT,AT,AT,AT

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