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专利名称：COMPOSITION FOR FORMING METAL-CONTAINING FILM, METHOD OF
PRODUCING COMPOSITION FOR FORMINGMETAL-CONTAINING FILM,
SEMICONDUCTOR DEVICE, AND METHODOF PRODUCING SEMICONDUCTOR DEVICE
发明人：Yasuhisa KAYABA,Shoko ONO,Hirofumi
TANAKA
申请号：US16301885申请日：20170519
公开号：US20190187560A1公开日：20190620
摘要：A composition for forming a metal-containing film, the composition including: acompound (A) which is at least one selected from the group consisting of: a compound(a1) containing a cationic functional group containing at least one of a primary nitrogenatom or a secondary nitrogen atom, and a compound (a2) which is a compound otherthan the compound (a1) and which contains a nitrogen atom; and a compound (B) which isat least one selected from the group consisting of: a compound (b1) containing a carboxygroup and at least one of a germanium atom, a tin atom, a selenium atom or a zirconiumatom, and an ester of the compound (b1).
申请人：MITSUI CHEMICALS, INC.
地址：Tokyo JP
国籍：JP
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